TECH - ASML Faces Setback as Huawei Innovates Beyond EUV Restrictions with Breakthrough Patent | Benzinga
Huawei Technologies Co and a confidential chipmaking partner in China have been advancing in semiconductor technology through patents for self-aligned quadruple patterning (SAQP), a method potentially circumventing the need for high-end lithography equipment barred by US export controls.
These developments, detailed in Chinese patent filings, could enable the production of advanced semiconductors without relying on extreme ultraviolet lithography (EUV) machines from ASML Holding NV (NASDAQ:ASML), the sole supplier forbidden from selling these machines to China. The ASML stock price declined after the update.
Quadruple patterning aims to enhance transistor density on silicon wafers, boosting chip performance, Bloomberg reports.
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